Resistive-Switching and Neuromorphic Devices Integrated with Photopolymer Platforms: Interfaces, Variability and Endurance

Photopolymers can enter resistive-switching and neuromorphic hardware in several fundamentally different roles: as an active polymeric switching medium, as a photocured dielectric, as a structural or encapsulating interface that modifies an oxide device, or as part of an additively manufactured conductor-polymer composite. These roles must not be collapsed into a single “printed memristor” category. Polymer memristors have a long history in solution-processed electronics, while recent work shows that UV-curable resin can chemically modify ZnO interfaces and shift switching from filamentary to more gradual interface-type behaviour. Separately, fully 3D-printed Cu-PLA crossbar devices demonstrate that additive polymer composites can exhibit resistive switching through electromigration-driven filament formation. This review maps those evidence classes to photopolymer integration and focuses on mechanism identification, cycle-to-cycle and device-to-device variability, retention, endurance, analogue weight-update linearity and interface ageing. A qualification framework is proposed in which electrical function is verified after photopolymer processing and environmental stress, with explicit separation of active switching layer, dielectric, encapsulant and structural platform. ER-430.