Convergence of Photopolymer Manufacturing and Semiconductor-Oriented Patterning: Resist Materials, Cure, Interfaces and Nanoimprint Replication

Segurola, Juan

2026-10-15 · Report · Version 0.1

ER-495 · Engineering Review · Version 0.1. Juan Segurola. 3Dresyns by Resyner Technologies S.L.

Full text